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1 article(s) from Williams, Joshua

TEM sample preparation of lithographically patterned permalloy nanostructures on silicon nitride membranes

Joshua Williams,
Michael I. Faley,
Joseph Vimal Vas,
Peng-Han Lu and
Rafal E. Dunin-Borkowski

Beilstein J. Nanotechnol. 2024, 15, 1–12, doi:10.3762/bjnano.15.1

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Figure 1: Lift-off fabrication process.

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Figure 2: SEM images of the 3 mm TEM window grid that provides nine windows of free-standing 50 nm thick SiN ...

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Figure 3: (a) Electron beam exposure scheme. (b) Cross section of developed resist with multi-dose exposure o...

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Figure 4: HRTEM image of a Py nanodisk. The grain sizes are around 6 nm.

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Figure 5: (a) SEM image of a Py disk (1 µm diameter, 50 nm thickness) at a tilt angle. (b) TEM image of a Py ...

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Figure 6: Ion beam etching process.

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Figure 7: Comparison between normal patterned resist (top) and reflowed resist (bottom). From left to right: ...

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Figure 8: (a) SEM image of a Py disk (1 µm diameter, 80 nm thickness) at a tilt angle. (b) TEM image of a Py ...

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Figure 9: (a) Hard mask preparation. (b) SEM image of the hard mask. (c) SEM images of deposited Py and a 1 µ...

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Figure 10: SiN membrane preparation on a nanostructure.

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Figure 11: (a) Lithography mask. (b) Etched substrate still attached to the bulk substrate. (c) Free-standing ...

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Figure 12: Tilted sample and the external magnetic field component.

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Figure 13: (a) Simplified illustration of the LTEM technique. (b) LTEM image of a 1 µm Py disk. (c) LTEM image...

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Figure 14: Magnetic induction map of a nanodisk under various magnetic fields obtained by off-axis electron ho...

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Published 02 Jan 2024

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